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Allongue Philippe

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Groupe Electrochimie et Couches Minces

Contact :

33 (0)1 69 33 46 73

Education : Engineering degree (École Supérieure d’Électricité, 1980) and DEA « Material science » (University P & M Curie, Paris, 1980) ; Doctorate 3ème cycle « Material science » (University P & M Curie, Paris, 1983) ; « Material science » ; PhD degree (University P & M Curie, Paris, 1988) ; Habilitation in Physics (University P & M Curie, Paris, 1994)

Positions : CNRS staff member since 1983 at LISE (UPR 15, 1983-2003) and at PMC (UMR 7643, 2003 - present). Alexander von Humboldt fellow in the group of H. Gerischer (Fritz-Haber Institute, Berlin, 1990 -1992)

Awards : Bronze Medal of CNRS (1989) ; Alexander von Humboldt Fellowship (1990 -1992) ; Hellmuth Fischer Medal (DECHEMA, 1997) ; Faraday Medal of the Royal Society of Chemistry (1999) ; Electrodeposition Research Award of Electrochemical Society (2010)

Teaching : Master of Nanosciences (lien :

Research :
After a doctorate about the photoelectrochemitry of III-V compound semiconductors, I joined Prof. Heinz Gerischer in Berlin to study silicon anisotropic etching using in situ STM with atomic resolution. Since then I developed a surface science approach of electrochemical interface aiming at synthesizing and characterizing functional nanostructures of interest in different fields. My current and past research includes :Retour ligne automatique
The organic modification of silicon surfaces to elaborate efficient photoswitching surfaces, template to grow multiferroic films and heterostructures, and develop new biosensors.Retour ligne automatique
Magnetic ultrathin films with emphasis on magnetic anisotropy, influence of the electric field, and role of local atomic environment (alloys, surface chemistry)Retour ligne automatique
Fundamental aspects of electrochemical deposition with emphasis on the codeposition, deposition on bimetallic surfaces, and also metal on Si deposition.Retour ligne automatique
Electrochemical nanolithography with an electrochemical AFM,Retour ligne automatique
Silicon anisotropic etching,

Selected publications :Retour ligne automatique
[1] P. Allongue, V. Costa Kieling, and H. Gerischer, "Etching of Silicon in NaOH Solutions .1. In situ Scanning Tunneling Microscopic Investigation of n-Si(111)," J. Electrochem. Soc. 140 (4), 1009-1018 (1993).Retour ligne automatique
[2] P. Allongue, "Molecular imaging and local density of states characterization at the Si(111)/NaOH interface," Phys. Rev. Lett. 77 (10), 1986-1989 (1996).Retour ligne automatique
[3] P. Allongue, M. Delamar, B. Desbat, O. Fagebaume, R. Hitmi, J. Pinson, and J. M. Saveant, "Covalent modification of carbon surfaces by aryl radicals generated from the electrochemical reduction of diazonium salts," J. Am. Chem. Soc. 119 (1), 201-207 (1997).Retour ligne automatique
[4] C. Henry de Villeneuve, J. Pinson, M. C. Bernard, and P. Allongue, "Electrochemical formation of close-packed phenyl layers on Si(111)," Journal of Physical Chemistry B 101 (14), 2415-2420 (1997).Retour ligne automatique
[5] A. Faucheux, A. C. Gouget-Laemmel, C. H. de Villeneuve, R. Boukherroub, F. Ozanam, P. Allongue, and J. N. Chazalviel, "Well-defined carboxyl-terminated alkyl monolayers grafted onto H-Si(111) : Packing density from a combined AFM and quantitative IR study," Langmuir 22 (1), 153-162 (2006).Retour ligne automatique
[6] J. N. Chazalviel and P. Allongue, "On the Origin of the Efficient Nanoparticle Mediated Electron Transfer across a Self-Assembled Monolayer," J. Am. Chem. Soc. 133 (4), 762-764 (2011).Retour ligne automatique
[7] R. Schuster, V. Kirchner, P. Allongue, and G. Ertl, "Electrochemical micromachining," Science 289 (5476), 98-101 (2000).Retour ligne automatique
[8] O. de Abril, A. Gundel, F. Maroun, P. Allongue, and R. Schuster, "Single-step electrochemical nanolithography of metal thin films by localized etching with an AFM tip," Nanotechnology 19 (32) (2008).Retour ligne automatique
[9] A. Damian, F. Maroun, and P. Allongue, "Selective Growth and Dissolution of Ni on a PdAu Bimetallic Surface by In Situ STM : Determining the Relative Adsorbate-Substrate Interaction Energy," Phys. Rev. Lett. 102 (19), 196101 (2009).Retour ligne automatique
[10] P. Allongue and F. Maroun, "Electrodeposited magnetic layers in the ultrathin limit," MRS Bulletin 35 (10), 761-770 (2010).Retour ligne automatique
[11] N. Tournerie, A. P. Engelhardt, F. Maroun, and P. Allongue, "Influence of the surface chemistry on the electric-field control of the magnetization of ultrathin films," Phys. Rev. B 86 (10), 104434 (2012).